Lecture
Van Marum Mini-Symposium: EUV-induced hydrogen plasma, and risks for optics degradation and particle contamination control
- Date
- Thursday 2 July 2026 - Wednesday 8 July 2026
- Location
-
Gorlaeus Building
Einsteinweg 55
2333 CC Leiden - Room
- CE.0.18
Abstract
ASML’s flagship EUV scanners operate in a low-pressure hydrogen background, to prevent oxidation of the mirrors and buildup of carbon contamination on these mirrors. A consequence of this is that the hydrogen background gas in ionized by EUV into a hydrogen plasma. This is an extremely reducing environment that affects both the mirrors and the surrounding construction materials, which leads to risks for mirror degradation and microparticle formation. This presentation will describe the specifics of the EUV-induced plasma, the possible damage mechanisms and mitigations and solutions.