Universiteit Leiden

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Lecture

FRESH Lecture: Ambient pressure x-ray photoelectron spectroscopy: a tool for the monitoring of surface chemical processes at realistic pressure and in real time

Date
28 February 2019
Time
Location
Gorlaeus Building
Einsteinweg 55
2333 CC Leiden
Room
GM4.13

Abstract

Ambient pressure x-ray photoelectron spectroscopy (APXPS) is a technique, which during the past 15 years has developed into being one of the primary experimental techniques for in situ and operando research into catalysis and many other areas. In contrast to conventional, vacuum-based photoelectron spectroscopy, APXPS allows monitoring surface chemical processes at pressures around 0.1 to 10 mbar (with the present record being 2 bar). Synchrotron-based APXPS offers the additional benefit of high count rates, which makes real-time monitoring possible. In my talk I will present the technique and illustrate with examples from the domains of catalysis and thin films growth (atomic layer deposition, ALD, and chemical vapour deposition (CVD)).

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